Chemical fabrication of overhanging ledges and reflection gratin

Details Chemical fabrication of overhanging ledges and reflection gratin Chemical fabrication of overhanging ledges and reflection gratin

1973-12-28

1978-06-13

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

156647, 156652, 156655, 156657, 156659, 156663, 156664, G03C 500

Patent

active

040946770

ABSTRACT:
A method is described of etching structures into .alpha. quartz and LiNbO.sub.3, two materials widely used in surface wave devices and which heretofore have not been found suitable for use with chemical etching techniques, in which concentrated HF acid at a predetermined temperature is used as an etchant, and the formation of overhanging ledges accomplished through a specific crystal orientation. Steps are shown which avoid the problems associated with suitable masking of the surface, which problems were encountered in the prior art, a primary step being one of a mechanical-chemical polishing to assure that the resist mask adheres to the surface properly.

REFERENCES:
patent: 3634159 (1972-01-01), Croskery
patent: 3657029 (1972-04-01), Fuller
patent: 3756887 (1973-09-01), Cruthers
patent: 3785892 (1974-01-01), Terry et al.
patent: 3799642 (1974-03-01), Phillips et al.
patent: 3816194 (1974-06-01), Kroger et al.

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