Chemical etching of lithographic aluminum substrate

Details Chemical etching of lithographic aluminum substrate Chemical etching of lithographic aluminum substrate

1982-08-13

1985-06-18

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430278, 101459, 1014631, 204 33, 156665, G03F 702

Patent

active

045241252

ABSTRACT:
The method of production of lithographic aluminum substrates which comprises first mechanically graining a surface of an aluminum sheet to obtain a pumice grained surface and then etching with a hot sulfuric acid (10-90%) solution.

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patent: 4377447 (1983-03-01), Bednarz
patent: 4388159 (1983-06-01), Dockus et al.
patent: 4420549 (1983-12-01), Cadwell
patent: 4477317 (1984-10-01), Chu et al.
patent: 4497888 (1985-02-01), Nishioka et al.

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