Chemical compositions for improving photolithographic performanc

Details Chemical compositions for improving photolithographic performanc Chemical compositions for improving photolithographic performanc

1990-06-06

1993-01-19

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Processing feature prior to imaging

430272, 430273, 430394, G03C 500

Patent

active

051806550

ABSTRACT:
Chemical compositions are presented that provide an increased rate of processing in a photolithography process in which a bleachable layer on top of a photoresist is bleached to produce a contact mask and then the photoresist is exposed through this contact mask. These compositions have increased oxygen permeability and increased solubility for a bleachable dye. Also, a class of dyes is presented that increase the process speed.

REFERENCES:
patent: 4705729 (1987-11-01), Sheats
patent: 4792516 (1988-12-01), Toriumi et al.
Bassous et al., IBM Tech. Dis. Bull. vol. 23 (7B), Dec. 1980, pp. 3387-3390.
Miller et al., "New Materials for Optical Microlithography", J. Imaging Sci., vol. 31(2), Mar./Apr. 1987, pp. 43-46.

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