Chemical amplifying type positive resist composition

Details Chemical amplifying type positive resist composition Chemical amplifying type positive resist composition

2005-10-11

2005-10-11

Thornton, Yvette C (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000, C524S377000

Reexamination Certificate

active

06953651

ABSTRACT:
A chemical amplifying type positive resist composition having excellent sensitivity and resolution, manifesting no generation of scum is provided, which comprises a resin which has a polymerization unit derived from hydroxystyrene and a polymerization unit derived from 2-ethyl-2-adamantyl (meth)acrylate, and is insoluble or poorly soluble itself in an alkali, but becomes alkali-soluble after dissociation of the above-mentioned acid unstable group by the action of an acid; a radiation sensitive acid generating agent; and polypropylene glycol.

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JP 10-048826 Urano et al., abstract; Polymer Composition and Resist Material Containing the Same.
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