Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-01-09
2007-01-09
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S270100, C430S281100, C430S921000, C430S922000, C430S914000, C522S015000, C522S025000, C522S031000
Reexamination Certificate
active
10682038
ABSTRACT:
The present invention provides a sulfonium salt of the formula (Ia)a polymeric compound comprising a structural unit of the formula (Ib)and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and(B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
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Derwent-Acc-No.: 1966-136264, Derwent -Week: 199831, Hasegawa et al, Patent FAmily inclusive of JP 08027102 A and US 5691111 A, two pages printed out Feb. 5, 2006 from EAST, Derwent Database.
Kamabuchi Akira
Uetani Yasunori
Yamada Airi
Hamilton Cynthia
Sumitomo Chemical Company Limited
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