Chemical amplification type resist composition

Details Chemical amplification type resist composition Chemical amplification type resist composition

2007-05-22

2007-05-22

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S910000, C430S914000, C430S921000, C430S919000

Reexamination Certificate

active

10657149

ABSTRACT:
The present invention provides a chemical amplification type positive resist composition comprisinga nitrogen containing compound of the formula (VIa) or (VIb);resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; andan acid generator of the formula (I)

REFERENCES:
patent: 6479210 (2002-11-01), Kinoshita et al.
patent: 6753128 (2004-06-01), Lee et al.
patent: 07-092681 (1995-04-01), None
patent: 2001-5184 (2001-01-01), None
CAplus Abstract DN 124:131526 for JP 07-092681, Apr. 1995.
English Translation of Examples in JP 07-092681, Apr. 1995, claims, sections 1-137,139-149.
Wakisaka, T. et al. Development of Advanced ArF Resist Using Alicyclic Methacrylate Copolymer,SPIE,3999,2000,1088-1099.

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