Chemical amplification type positive resist composition and...

Details Chemical amplification type positive resist composition and... Chemical amplification type positive resist composition and...

2007-02-13

2007-02-13

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S910000, C430S921000, C430S925000

Reexamination Certificate

active

10952793

ABSTRACT:
A resin which comprises (1) at least one structural unit selected from the group consisting of a structural unit derived from 3-hydroxy-1-adamantyl (meth)acrylate, a structural unit derived from 3,5-dihydroxy-1-adamantyl (meth)acrylate, a structural unit derived from (meth)acryloyloxy-γ-butyrolactone having a lactone ring optionally substituted by alkyl, a structural unit of the formula (Ia) and a structural unit of the formulaand (2) a structural unit of the formula (II)and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and also provides a chemical amplification type positive resist composition comprising a resin defined above and an acid generator.

REFERENCES:
patent: 6576392 (2003-06-01), Sato et al.
patent: 1000924 (2000-05-01), None
patent: 1 338 922 (2003-08-01), None
patent: 2003-131382 (2003-05-01), None
Machine-assisted English translation for JP 2003-131382, provided by JPO.
Chem. Abstract 138:376397 - English abstract for JP 2003-131382.

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