Chemical amplification type positive resist composition

Details Chemical amplification type positive resist composition Chemical amplification type positive resist composition

2005-05-17

2005-05-17

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000

Reexamination Certificate

active

06893794

ABSTRACT:
A chemical amplification type positive resist composition comprising:(A) a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and which contains a structural unit derived from p-hydroxystyrene and a structural unit represented by the formula (Ia) or (Ib)wherein R1and R2each independently represents hydrogen or methyl, and R3to R5each independently represents alkyl having 1 to 8 carbon atoms; and(B) radiation-sensitive acid generator comprising sulfonic acid ester of N-hydroxyimide compound; and onium salt is provided.

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patent: 1 167 349 (2002-01-01), None
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