Chemical amplification type positive resist composition

Details Chemical amplification type positive resist composition Chemical amplification type positive resist composition

2007-04-17

2007-04-17

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S914000, C430S921000

Reexamination Certificate

active

11037286

ABSTRACT:
The present invention provides a chemical amplification type positive resist composition comprising(A) a resin which comprises (i) 5 to 50% by mol of a structural unit of the formula (I), (ii) 5 to 50% by mol of a structural unit of the formula (II) and (iii) 5 to 50% by mol of at least one selected from the group consisting of structural units of the formulas (III) and (IV), and(B) an acid generator. The present composition is suitable for excimer laser lithography using ArF, KrF and the like, and shows various outstanding resist abilities, specifically, gives better effective sensitivity and resolution to resist patterns obtained therefrom, and gives particularly excellent pattern shape and excellent line edge roughness.

REFERENCES:
patent: 6239231 (2001-05-01), Fujishima et al.
patent: 6579659 (2003-06-01), Uetani et al.
patent: 2004/0191676 (2004-09-01), Nakao et al.
patent: 0856773 (1998-08-01), None
patent: 8-101509 (1996-04-01), None
patent: 2003-202673 (2003-07-01), None
patent: 2003-280201 (2003-10-01), None

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