Chemical amplification resist composition and...

Details Chemical amplification resist composition and... Chemical amplification resist composition and...

2005-08-18

2008-09-16

Hamilton, Cynthia (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S270100, C430S326000

Reexamination Certificate

active

07425404

ABSTRACT:
A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15, and (D) a solvent, and a pattern-forming method using the same.

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English translation of JP, 2003-287890, A (2003) from machine translation from AIPN Japan Patent Office Natinal center for Industrial Property Information and Training, generated Jul. 10, 2007, 17 pages.
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Extended European Search Report dated Mar. 19, 2008.

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