Chemical amplification resist composition and...

Details Chemical amplification resist composition and... Chemical amplification resist composition and...

2008-09-16

2008-09-16

Hamilton, Cynthia (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S270100, C430S326000

Reexamination Certificate

active

11206220

ABSTRACT:
A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15, and (D) a solvent, and a pattern-forming method using the same.

REFERENCES:
patent: 5360692 (1994-11-01), Kawabe et al.
patent: 5405720 (1995-04-01), Hosaka et al.
patent: 5529881 (1996-06-01), Kawabe et al.
patent: 5824451 (1998-10-01), Aoai et al.
patent: 5849461 (1998-12-01), Hatakeyama
patent: 2003/0099901 (2003-05-01), Hatakeyama et al.
patent: 2004/0053161 (2004-03-01), Kanna et al.
patent: 0 445 058 (1991-09-01), None
patent: 1 275 666 (2003-01-01), None
patent: 1 505 440 (2005-02-01), None
patent: 4-217251 (1992-08-01), None
patent: 9-185158 (1997-07-01), None
patent: 2003-156845 (2003-05-01), None
patent: 2003-270791 (2003-09-01), None
patent: 2003-287890 (2003-10-01), None
patent: WO 02/31595 (2002-04-01), None
English translation of JP, 2003-287890, A (2003) from machine translation from AIPN Japan Patent Office Natinal center for Industrial Property Information and Training, generated Jul. 10, 2007, 17 pages.
Ferreira et al “Choice of amines as stabilizers for chemically amplifted resist systems”, Proceedings of SPIE, vol. 333, Advances in Resist Technology and Processing XV, WIII Conely, Ed, Jun. 1998, pp. 236-244.
Hamad et al, “Fluorinated dissolution inhibiotrs for 157 nm lithography”, Proceedings of SPIE vol. 4690, Advances in Resist TEchnology and Processing XIX, Fedynyshyn, ed, Jul. 2002, pp. 477-485.
Extended European Search Report dated Mar. 19, 2008.

Affiliated with

Also associated with

Rating

Chemical amplification resist composition and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical amplification resist composition and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical amplification resist composition and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3946666