Chemical amplification resist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S905000, C430S910000

Reexamination Certificate

active

06887646

ABSTRACT:
The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25° C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.

REFERENCES:
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patent: 5624787 (1997-04-01), Watanabe et al.
patent: 5770343 (1998-06-01), Sato et al.
patent: 5876900 (1999-03-01), Watanabe et al.
patent: 5968713 (1999-10-01), Nozaki et al.
patent: 0 537 524 (1993-04-01), None
patent: 0 749 044 (1996-12-01), None
patent: 0 856 773 (1998-08-01), None
patent: 6-266110 (1994-09-01), None
patent: 7-92681 (1995-04-01), None
patent: 10-207069 (1998-08-01), None
Derwent Abstracts AN 88-215340, XP-002031001, JP 63-149640, Jun. 22, 1988.

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