Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-05-03
2005-05-03
Ashton, Rosemary (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S910000
Reexamination Certificate
active
06887646
ABSTRACT:
The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25° C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.
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Derwent Abstracts AN 88-215340, XP-002031001, JP 63-149640, Jun. 22, 1988.
Fujiwara Tadayuki
Tooyama Masayuki
Wakisaka Yukiya
Ashton Rosemary
Mitsubishi Rayon Co. Ltd.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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