Chemical amplification resist and a fabrication process of a sem

Details Chemical amplification resist and a fabrication process of a sem Chemical amplification resist and a fabrication process of a sem

1996-03-04

1997-08-26

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430313, 430311, G03F 700

Patent

active

056609698

ABSTRACT:
A chemical amplification resist contains a polymer of adamantyl group and aliphatic ester, wherein the aliphatic ester has a carbonyl group such that the chemical amplification resist generates carboxylic acid upon exposure to radiation.

REFERENCES:
patent: 5230984 (1993-07-01), Tachiki

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