Chemical amplification, positive resist compositions

Details Chemical amplification, positive resist compositions Chemical amplification, positive resist compositions

2005-01-04

2005-01-04

Huff, Mark F. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S311000, C430S319000, C430S905000, C430S910000, C430S914000, C430S921000, C430S925000, C430S919000, C430S920000

Reexamination Certificate

active

06838224

ABSTRACT:
A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: C6H11—(CH2)nOCH(CH2CH3)— wherein C6H11is cyclohexyl and n=0 or 1. The composition has many advantages including improved focal latitude, improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect left after coating, development and stripping, and improved pattern profile after development and is suited for microfabrication by any lithography, especially deep UV lithography.

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Machine-assisted English translation for JP 2000-235264 (provided by Japan Patent Office), Aug. 29, 2000.*
English abstract of JP-A 63-27829.
English abstract of JP-A 6-308437.

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