Chelation cleaning process for repairing photomasks

Details Chelation cleaning process for repairing photomasks Chelation cleaning process for repairing photomasks

2006-03-21

2006-03-21

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07014960

ABSTRACT:
The present invention relates to a method for repairing a photomask by removing a residual defect in the photomask, the method including removing the defect area by gallium chelation with a water-soluble amine polymer.

REFERENCES:
patent: 5965301 (1999-10-01), Nara et al.

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