Charged particle source of large current with high energy

Details Charged particle source of large current with high energy Charged particle source of large current with high energy

1988-07-08

1991-01-22

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511131, 31511181, 250396R, 250423R, 31323131, H05H 124

Patent

active

049873458

ABSTRACT:
A plasma ion source comprises coaxially oriented electrodes of which a first electrode has the shape of a rod and a second electrode an annular shape, positioned in a space filled with a gas of atomic number greater than that of Boron, a current source up to 100 KA to be reacted within 1 usec and structure for focussing ions located near a formed pinch plasma.

REFERENCES:
patent: 3329865 (1967-07-01), Jaatinen
patent: 3579027 (1971-05-01), Pater
patent: 4447773 (1984-05-01), Aston
patent: 4710632 (1987-12-01), Ishitani et al.
patent: 4737688 (1988-04-01), Collins et al.
patent: 4800281 (1989-01-01), Williamson

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