Charged-particle source, control system, and process using gatin

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source

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Details

31511131, 250423R, 250424, H01J 2702, H05H 124

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active

059821019

ABSTRACT:
A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.

REFERENCES:
patent: 4759948 (1988-07-01), Hashimoto et al.
patent: 5097179 (1992-03-01), Takayama
patent: 5444259 (1995-08-01), Ohmi
patent: 5556521 (1996-09-01), Ghanbari
European Search Report for PCT/US 98/12915, corresponding to U.S. 08/883,696.

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