Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1997-06-27
1999-11-09
Bettendorf, Justin P.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31511131, 250423R, 250424, H01J 2702, H05H 124
Patent
active
059821019
ABSTRACT:
A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.
REFERENCES:
patent: 4759948 (1988-07-01), Hashimoto et al.
patent: 5097179 (1992-03-01), Takayama
patent: 5444259 (1995-08-01), Ohmi
patent: 5556521 (1996-09-01), Ghanbari
European Search Report for PCT/US 98/12915, corresponding to U.S. 08/883,696.
Fremgen, Jr. Roger P.
Hayes Alan V.
Jacob John
Kanarov Victor
Lakios Emmanuel N.
Bettendorf Justin P.
Veeco Instruments Inc.
LandOfFree
Charged-particle source, control system, and process using gatin does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Charged-particle source, control system, and process using gatin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged-particle source, control system, and process using gatin will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1460848