Charged particle exposure apparatus, and a charged particle expo

Details Charged particle exposure apparatus, and a charged particle expo Charged particle exposure apparatus, and a charged particle expo

1996-12-04

1998-06-23

Anderson, Bruce

Radiant energy

With charged particle beam deflection or focussing

With target means

250396R, H01J 37147

Patent

active

057708622

ABSTRACT:
The present invention relates to a charged particle beam exposure apparatus, deflecting a charged particle beam formed into a predetermined shape by being passed through a predetermined transmission mask, and irradiating a predetermined location on the surface of a sample with the charged particle beam. The apparatus comprises: a mirror barrel through which the charged particle beam is passed; and an electrostatic deflector, provided in the mirror barrel, for deflecting the charged particle beam. The electrostatic deflector has a plurality of pairs of electrodes, which are made of a conductive material having carbon as a primary element and are embedded in an internal face of an insulating cylinder. The present invention also relates to a method for forming the electrostatic deflector.

REFERENCES:
patent: 4525629 (1985-06-01), Morita et al.
patent: 5041731 (1991-08-01), Oae et al.
patent: 5393988 (1995-02-01), Sakamoto
patent: 5444256 (1995-08-01), Nagai et al.

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