Charged particle beam writing method

Details Charged particle beam writing method Charged particle beam writing method

2011-04-12

2011-04-12

Vanore, David A (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492200, C250S492210, C250S492300

Reexamination Certificate

active

07923704

ABSTRACT:
A charged particle beam writing method includes writing a pattern on a first target object by using a charged particle beam in a writing apparatus; and conveying a second target object after having written the pattern on the first target object, wherein even though the second target object is arranged on any one of conveying paths including a carry-out port and a carry-in port of the writing apparatus, a conveying operation for the second target object is not performed during writing the pattern on the first target object.

REFERENCES:
patent: 4516030 (1985-05-01), Tsuchikawa et al.
patent: 2005/0199807 (2005-09-01), Watanabe et al.
patent: 9-237745 (1997-09-01), None
patent: 2006-303361 (2006-11-01), None
patent: 2007-34143 (2007-02-01), None

Affiliated with

Also associated with

Rating

Charged particle beam writing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged particle beam writing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam writing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2696159