Charged particle beam writing apparatus and optical axis...

Details Charged particle beam writing apparatus and optical axis... Charged particle beam writing apparatus and optical axis...

2010-03-03

2011-12-13

Souw, Bernard E (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S397000, C250S398000, C250S492200, C250S492220

Reexamination Certificate

active

08076649

ABSTRACT:
A charged particle beam writing apparatus includes a stage on which a target object is placed; an emitting unit configured to emit a charged particle beam to the stage side; a blocking unit arranged between the emitting unit and the stage and configured to block the charged particle beam emitted; a deflector having electrodes through which a current flows by applying a voltage and configured to deflect the charged particle beam passing between the electrodes onto the blocking unit by applying a predetermined voltage across the electrodes; an optical axis adjusting unit configured to correct optical axis deviation of the charged particle beam generated by continuously repeating irradiation (beam-ON) of the charged particle beam on a target object and blocking (beam-OFF) of the beam by applying a two-step voltage to the deflector; and a control unit configured to control the optical axis adjusting unit such that an amount of the optical axis deviation is corrected.

REFERENCES:
patent: 7084411 (2006-08-01), Lammer-Pachlinger et al.
patent: 7173262 (2007-02-01), Hosoda et al.
patent: 2005/0087701 (2005-04-01), Lammer-Pachlinger et al.
patent: 11-150055 (1999-06-01), None

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