Charged particle beam writing apparatus and method thereof

Details Charged particle beam writing apparatus and method thereof Charged particle beam writing apparatus and method thereof

2008-07-07

2011-12-20

Johnston, Phillip A (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S492200, C250S492220

Reexamination Certificate

active

08080809

ABSTRACT:
A charged particle beam writing apparatus includes a unit emitting a charged particle beam, a stage on which a target workpiece to be written is placed, a unit correcting a reference position of a small region in a writing region, based on a pattern distortion obtained from positions of figures spread over substantially all writing region of a dummy target workpiece and written without correcting, a first deflector deflecting the beam, based on a corrected reference position obtained by correcting the reference position, a correction unit correcting a relative distance from the corrected reference position to an arbitrary position in the small region, based on a pattern distortion of the dummy, by using the reference position and a coefficient of a correction equation for correcting the reference position, and a second deflector further deflecting the beam from a position deflected by the first deflector, based on the relative distance corrected.

REFERENCES:
patent: 5168166 (1992-12-01), Hayakawa et al.
patent: 5422491 (1995-06-01), Sakamoto
patent: 6177680 (2001-01-01), Dick et al.
patent: 3197024 (2001-06-01), None

Affiliated with

Also associated with

Rating

Charged particle beam writing apparatus and method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged particle beam writing apparatus and method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam writing apparatus and method thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4261166