Charged particle beam trajectory corrector and charged...

Details Charged particle beam trajectory corrector and charged... Charged particle beam trajectory corrector and charged...

2011-01-25

2011-01-25

Berman, Jack I (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML, C250S492100, C250S492300

Reexamination Certificate

active

07875858

ABSTRACT:
The invention relates to a trajectory correction method for a charged particle beam, and provides a low-cost, high accuracy and high-resolution converging optical system for use with a charged particle beam to solve problems with conventional aberration correction systems. To this end, the present invention uses a configuration which forms electromagnetic field which is concentrated towards a center of a beam trajectory axis, causes oblique of the beam to make use of lens effects and bend the trajectory, and consequently, cancels out large external side non-linear effects such a spherical aberration of the electron lens. Specifically, the configuration generates an electric field concentration in a simple manner by providing electrodes above the axis and applying voltages to the electrodes. Further, the above configuration can be realized trough operations using lenses and deflectors with incident axes and image formation positions that are normal.

REFERENCES:
patent: 3100260 (1963-08-01), Wilska
patent: 6441384 (2002-08-01), Kojima
patent: 2008/0116391 (2008-05-01), Ito et al.
patent: 2008/0230711 (2008-09-01), Platzgummer et al.
patent: 2000-012454 (2000-01-01), None
patent: 2006-080155 (2006-03-01), None
Rose, H., “Outline of an ultracorrector compensating for all primary chromatic and geometrical aberrations of charged-particle lenses,” Nuclear Instruments and Methods in Physics Research, Section A, 519, pp. 12-27 (2004).
Stickel, W. et al., “Evolution of electron projection optics from variable axis immersion lenses to projection reduction exposure with variable axis immersion lenses,” J. Vac. Sci. Technol. B 20(6), Nov./Dec. 2002.

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