Charged particle beam system having beam-defining slit formed by

Details Charged particle beam system having beam-defining slit formed by Charged particle beam system having beam-defining slit formed by

1996-01-16

1997-05-13

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2505051, H01J 3709

Patent

active

056295286

ABSTRACT:
A slit assembly for use in a charged particle beam system wherein a charged particle beam is directed along a beam path. The slit assembly may be a mass resolving slit assembly for an ion implanter. The slit assembly includes first and second cylinders spaced apart from each other. Opposing surfaces of the first and second cylinders adjacent to the beam path define a slit for passing the charged particle beam. The first and second cylinders have first and second central axes, respectively. The slit assembly further includes a drive system for rotating the first cylinder about the first central axis and for rotating the second cylinder about the second central axis. The slit assembly provides low contamination and a long operating life. The slit assembly may include a system for adjusting the width of the slit. The slit assembly may further include a cooling system for controlling the temperatures of the first and second cylinders.

REFERENCES:
patent: 4017403 (1977-04-01), Freeman
patent: 4118630 (1978-10-01), McKenna et al.
patent: 4283631 (1981-08-01), Turner
patent: 4578589 (1986-03-01), Aitken
patent: 4980562 (1990-12-01), Berrian et al.
patent: 5130552 (1992-07-01), Bright et al.

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