Charged-particle beam lithography and cassette for material patt

Details Charged-particle beam lithography and cassette for material patt Charged-particle beam lithography and cassette for material patt

1991-02-12

1992-08-25

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

2504922, G21K 508

Patent

active

051421542

ABSTRACT:
Method of writing a desired pattern onto a material with a focused charged-particle beam. The method is initiated by holding the material to be patterned on a cassette. The material is held on the cassette in such a way that the strains produced on the surface of the material are represented by substantially parallel straight contour lines. Under this condition, a desired pattern is written on the material while correcting beam shot position errors caused by the strains. Consequently, the errors regarding beam shot positions caused by the strains of the material are accurately corrected.

REFERENCES:
patent: 4159799 (1979-07-01), Alles et al.
patent: 4280054 (1981-07-01), Guarino
patent: 4412133 (1983-10-01), Eckes et al.
patent: 4651009 (1987-03-01), Totsuka
patent: 4711438 (1987-12-01), Guarino
patent: 4851692 (1989-07-01), Villano

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