Charged particle beam exposure system and method of compensating

Details Charged particle beam exposure system and method of compensating Charged particle beam exposure system and method of compensating

1988-09-12

1990-01-02

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With target means

250396ML, H01J 3704

Patent

active

048915246

ABSTRACT:
A method for compensating for an eddy current effect due to leakage flux of a magnetic lens in a charged particle beam exposure system, and a system for exposing the beam on a substrate while a stage carrying the substrate is moving. By employing this method and system, a step and repeat system can be operated while the stage is moving, while improving the throughput of the system. A deviation in the path of the charged particle beam caused by the eddy current is proportional to the velocity of the stage. To compensate for this, a proportional constant relating the deviation to the velocity of the stage is measured in advance, and a correction term which is a product of the speed of the stage and the proportional constant, is fed back to a deflector of the charged particle beam. The proportional constant is obtained from a shift of an image of a test pattern viewed on a CRT in a SEM mode, from a first position at which the stage is stationary to a second position while the stage is moving at a constant speed.

REFERENCES:
patent: 3922546 (1975-11-01), Livesay
patent: 4125772 (1978-11-01), Holmes
patent: 4251728 (1981-02-01), Pfeiffer et al.
patent: 4362942 (1982-12-01), Yasuda
patent: 4468565 (1984-08-01), Blair et al.
patent: 4544846 (1985-10-01), Langer et al.
patent: 4701623 (1987-10-01), Beasley
Journal of Vacuum Science & Technology B, Microelectronics Processing and Phenomena, vol. 5, 1987, American Vacuum Society, "A High Dose and High Accuracy Variable Shaped Electron Beam Exposure System for Quartermicron Device Fabrication", by Yoshikawa et al, pp. 70-74.

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