Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1997-04-28
1999-06-15
Anderson, Bruce
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, 250310, H01J 3730
Patent
active
059124687
ABSTRACT:
An object of the present invention is to provide a charged particle exposure system which can prevent the shift of an orbit of an electron beam in the vicinity of a periphery of a substrate when drawing a pattern onto the substrate, thereby making it possible to draw the pattern with high accuracy. According to the present invention, there is provided a charged particle beam exposure system comprising a holder for holding a substrate, a beam source for emitting a charged particle beam onto a surface of the substrate, beam scanning means for scanning the charged particle beam to draw a pattern on the surface of the substrate, a first electrical conductive block coming in electrical contact with a surface of a peripheral portion of the substrate, a first DC power supply unit for supplying an arbitrary voltage to the first electrical conductive block, a second electrical conductive block arranged to cover upside of the first electrical conductive block and upside of a peripheral portion along the periphery of the substrate, and to be electrically insulated from the substrate, and a second DC power supply unit for supplying the other arbitrary voltage to the second electrical conductive block.
REFERENCES:
patent: 3736422 (1973-05-01), Weber et al.
patent: 4408126 (1983-10-01), Tojo et al.
patent: 5270990 (1993-12-01), Mizasawa et al.
patent: 5387793 (1995-02-01), Sato et al.
patent: 5420433 (1995-05-01), Oae et al.
patent: 5668372 (1997-09-01), Iwabuchi et al.
SPIE, 11th Annual BACUS Symposium on Photomask Technology, 1991, vol. 1604, pp. 36-44, Maris A. Sturans, et al., "Positional Errors Due to Substrate Charging in E-Beam Lithography Tools".
Hirano Ryoichi
Koikari Souji
Matsuki Kazuto
Tojo Toru
Yoshitake Shusuke
Anderson Bruce
Kabushiki Kaisha Toshiba
LandOfFree
Charged particle beam exposure system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Charged particle beam exposure system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam exposure system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-404146