Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1998-08-25
2000-05-09
Nguyen, Kiet T.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
H01J 37302
Patent
active
060607173
ABSTRACT:
The present invention relates to a charged particle beam exposure method, wherein exposure data having exposure pattern data for each of a plurality of sub-fields located in a main field are acquired from pattern data for each of the sub-fields and a sample is exposed in accordance with the exposure data. The method comprises the steps of: forming a plurality of areas having different shapes, in accordance with patterns in the sub-fields, and acquiring pattern densities in the areas; correcting the pattern densities in accordance with pattern densities for areas surrounding the areas and with distances between the areas; generating auxiliary exposure patterns in the areas when the pattern densities for the areas are lower than a predetermined reference exposure density; and exposing the sample in accordance with the exposure data obtained by adding the data for the auxiliary exposure patterns to the pattern data. According to the present invention, a variable area can be formed, the number of areas can be reduced, and data processing can be performed more efficiently.
REFERENCES:
patent: 5955738 (1999-09-01), Manabe et al.
Hoshino Hiromi
Machida Yasuhide
Manabe Yasuo
Fujitsu Limited
Nguyen Kiet T.
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