Charged particle beam exposure method and charged particle...

Details Charged particle beam exposure method and charged particle... Charged particle beam exposure method and charged particle...

2009-07-24

2010-11-30

Garbowski, Leigh Marie (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C250S492230, C250S492200, C250S492300, C250S492220, C250S492100, C438S016000, C430S005000, C430S296000, C430S311000, C257SE21530

Reexamination Certificate

active

07844941

ABSTRACT:
When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block mask having the space and edge portions of the large patterns on both sides of the space, and portions other than the edge portions of the large patterns on both sides are exposed by a variable rectangular beam or by using another block mask.

REFERENCES:
patent: 6415432 (2002-07-01), Saito et al.
patent: 6541783 (2003-04-01), Robinson et al.
patent: 6901576 (2005-05-01), Liebmann et al.
patent: 2000323377 (2000-11-01), None
patent: 2001052999 (2001-02-01), None
patent: 2001168006 (2001-06-01), None
patent: 2004200275 (2004-07-01), None

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