Charged particle beam exposure method and apparatus

Details Charged particle beam exposure method and apparatus Charged particle beam exposure method and apparatus

2005-03-08

2005-03-08

Lee, John R. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

C250S310000, C250S311000

Reexamination Certificate

active

06864488

ABSTRACT:
An exposure method of drawing a pattern on a substrate using a charged particle beam. The method includes a detection step of placing a calibration substrate having a plurality of marks on a stage and detecting positions of the plurality of marks by a first position detection section using a charged particle beam and by a second position detection section using light while adjusting a position of the stage, and a correction step of correcting a position where the charged particle beam is incident on the substrate on which the pattern is to be drawn in drawing, in accordance with the position of the stage on the basis of the difference between detection results by the charged particle beam and the light in the detection step.

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