Charged-particle-beam exposure device and charged-particle-beam

Details Charged-particle-beam exposure device and charged-particle-beam Charged-particle-beam exposure device and charged-particle-beam

1997-08-26

1999-10-19

Nguyen, Kiet T.

Radiant energy

Means to align or position an object relative to a source or...

H01J 37304

Patent

active

059693657

ABSTRACT:
A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a focus coil provided above the deflector, obtaining a focus distance for each of the first marks, obtaining deflection-efficiency-correction coefficients for each of the first marks, and using linear functions of the focus distance for approximating the deflection-efficiency-correction coefficients to obtain the deflection-efficiency-correction coefficients for an arbitrary value of the focus distance. A device for carrying out the method is also set forth.

REFERENCES:
patent: 4334139 (1982-06-01), Wittekoek et al.
patent: 5047647 (1991-09-01), Itoh et al.
patent: 5757015 (1998-05-01), Takemoto et al.

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