Charged particle beam apparatus

Details Charged particle beam apparatus Charged particle beam apparatus

2007-07-24

2007-07-24

Berman, Jack I. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

C250S310000, C250S307000, C134S001300

Reexamination Certificate

active

11305109

ABSTRACT:
A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate adverse effects on the subsequent manufacturing processes. To achieve this objective, after the sample measurement or inspection is made by using a charged particle beam, contaminants on the sample are removed before the next semiconductor manufacturing process. This allows the contaminants adhering to the sample in the sample chamber to be removed and therefore failures or defects that may occur in a semiconductor fabrication process following the measurement and inspection can be minimized.

REFERENCES:
patent: 4789781 (1988-12-01), Kitagawa et al.
patent: 5091651 (1992-02-01), Hokke
patent: 5296669 (1994-03-01), Kobayashi et al.
patent: 5898177 (1999-04-01), Hidaka et al.
patent: 5914493 (1999-06-01), Morita et al.
patent: 6025592 (2000-02-01), Knowles et al.
patent: 7078689 (2006-07-01), Adler et al.
patent: 5-135752 (1993-06-01), None
patent: 9-171791 (1997-06-01), None
patent: 11-329328 (1999-11-01), None

Affiliated with

Also associated with

Rating

Charged particle beam apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged particle beam apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3729180