Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1990-02-06
1992-05-19
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430319, 430312, 437 53, 357 24, G03F 709, H01L 21339
Patent
active
051148331
ABSTRACT:
A charge-coupled device (CCD) of the two-phase type is disclosed. The CCD comprises two polysilicon levels which are electrically connected to form one clock phase. In order to provide a CCD of improved transfer efficiency, two implanted regions of different dopant levels are provided under each polysilicon level. When the CCD is clocked, a four-tier potential profile is produced.
REFERENCES:
patent: 3918997 (1975-11-01), Mohsen et al.
patent: 4035906 (1977-07-01), Tasch et al.
patent: 4063992 (1977-12-01), Hosack
patent: 4229752 (1980-10-01), Hynecek
patent: 4459325 (1984-07-01), Nozawa et al.
patent: 4732868 (1988-03-01), Nichols
patent: 4746622 (1988-05-01), Hawkins et al.
patent: 4779124 (1988-10-01), Hynecek
patent: 4900688 (1990-02-01), Halvis
patent: 4952523 (1990-08-01), Fujii
patent: 4992392 (1991-02-01), Nichols et al.
Eastman Kodak Company
Kaufman Stephen C.
McCamish Marion E.
RoDee C. D.
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