Chamber wafer detection

Details Chamber wafer detection Chamber wafer detection

2005-09-06

2005-09-06

Williams, Hezron (Department: 2856)

Measuring and testing

Testing of apparatus

C438S014000, C414S935000, C073S865800

Reexamination Certificate

active

06938505

ABSTRACT:
An apparatus and method for detecting in chamber wafer position and process status are disclosed. A chamber includes a processing pedestal and plurality of lift pins. Each lift pin has an associated load cell for measuring the load exerted by the wafer on the lift pins. Mispositioned wafers or broken wafers will result in load measurements outside of expected ranges. Position of the wafer may be determined from the load distribution sensed on the lift pins.

REFERENCES:
patent: 5946184 (1999-08-01), Kanno et al.
patent: 6499367 (2002-12-01), Saeki
patent: 2002/0114684 (2002-08-01), Jeong et al.
patent: 11195694 (1999-07-01), None
patent: 00156400 (2000-06-01), None

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