Chamber, exposure apparatus, and device manufacturing method

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S441110, C250S442110, C378S020000, C378S034000

Reexamination Certificate

active

07078706

ABSTRACT:
Disclosed is a chamber having a static-pressure bearing disposed therein, the chamber including an inside pressure gauge for detecting an inside pressure of said chamber, and a pressure controller for decreasing the inside pressure of the chamber on the basis of the detection made through the inside pressure gauge. This arrangement effectively prevents unwanted increase of the chamber inside pressure and avoids local breakage of the chamber.

REFERENCES:
patent: 3608023 (1971-09-01), Scarborough
patent: 4113175 (1978-09-01), Sutton, Jr.
patent: 4311037 (1982-01-01), Gotchel et al.
patent: 4420969 (1983-12-01), Saum
patent: 5871587 (1999-02-01), Hasegawa et al.
patent: 5957317 (1999-09-01), Lee
patent: 6616898 (2003-09-01), Hara et al.
patent: 6865926 (2005-03-01), O'Brien et al.
patent: 6873397 (2005-03-01), Yabu
patent: 6940582 (2005-09-01), Tanaka
patent: 2002/0036264 (2002-03-01), Nakasuji et al.
patent: 2002/0148961 (2002-10-01), Nakasuji et al.
patent: 2003/0202449 (2003-10-01), Miura et al.
patent: 2004/0046294 (2004-03-01), Kubo et al.
patent: 2005/0011581 (2005-01-01), Sakamoto
patent: 2005/0092921 (2005-05-01), Nakasuji et al.
patent: 3-211816 (1991-09-01), None
patent: 7-281446 (1995-10-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Chamber, exposure apparatus, and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chamber, exposure apparatus, and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chamber, exposure apparatus, and device manufacturing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3545760

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.