Chalcogenide layer etching method

Details Chalcogenide layer etching method Chalcogenide layer etching method

2006-02-23

2011-11-22

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

Reexamination Certificate

active

08062833

ABSTRACT:
A protective layer is deposited on a chalcogenide layer and a patterned photoresist layer is formed on the protective layer. The patterned photoresist layer and the protective layer are etched to form openings therethrough to the chalcogenide layer to create etched photoresist and etched protective layers. The etched photoresist layer is removed leaving at least a portion of the etched protective layer. The chalcogenide layer is etched through the openings in the etched protective layer.

REFERENCES:
patent: 3271591 (1966-09-01), Ovshinsky
patent: 3530441 (1970-09-01), Ovshinsky
patent: 4452592 (1984-06-01), Tsai
patent: 4599705 (1986-07-01), Holmberg et al.
patent: 4719594 (1988-01-01), Young et al.
patent: 4769339 (1988-09-01), Ishii et al.
patent: 4876220 (1989-10-01), Mohsen et al.
patent: 4959812 (1990-09-01), Momodomi et al.
patent: 5106775 (1992-04-01), Kaga et al.
patent: 5166096 (1992-11-01), Cote et al.
patent: 5166758 (1992-11-01), Ovshinsky et al.
patent: 5177567 (1993-01-01), Klersy et al.
patent: 5332923 (1994-07-01), Takeuchi et al.
patent: 5391901 (1995-02-01), Tanabe et al.
patent: 5515488 (1996-05-01), Hoppe et al.
patent: 5534712 (1996-07-01), Ovshinsky et al.
patent: 5550396 (1996-08-01), Tsutsumi et al.
patent: 5687112 (1997-11-01), Ovshinsky
patent: 5688713 (1997-11-01), Linliu et al.
patent: 5716883 (1998-02-01), Tseng et al.
patent: 5754472 (1998-05-01), Sim et al.
patent: 5789277 (1998-08-01), Zahorik et al.
patent: 5789758 (1998-08-01), Reinberg
patent: 5814527 (1998-09-01), Wolstenholme et al.
patent: 5831276 (1998-11-01), Gonzalez et al.
patent: 5837564 (1998-11-01), Sandhu et al.
patent: 5869843 (1999-02-01), Harshfield
patent: 5879955 (1999-03-01), Gonzalez et al.
patent: 5902704 (1999-05-01), Schoenborn et al.
patent: 5920788 (1999-07-01), Reinberg
patent: 5933365 (1999-08-01), Klersy et al.
patent: 5952671 (1999-09-01), Reinberg et al.
patent: 5958358 (1999-09-01), Tenne et al.
patent: 5970336 (1999-10-01), Wolstenholme et al.
patent: 5985698 (1999-11-01), Gonzalez et al.
patent: 5998244 (1999-12-01), Wolstenholme et al.
patent: 6011725 (2000-01-01), Eitan et al.
patent: 6025220 (2000-02-01), Sandhu
patent: 6031287 (2000-02-01), Harshfield
patent: 6034882 (2000-03-01), Johnson et al.
patent: 6046951 (2000-04-01), El Hajji et al.
patent: 6066870 (2000-05-01), Siek
patent: 6077674 (2000-06-01), Schleifer et al.
patent: 6077729 (2000-06-01), Harshfield
patent: 6087269 (2000-07-01), Williams
patent: 6087674 (2000-07-01), Ovshinsky et al.
patent: 6104038 (2000-08-01), Gonzalez et al.
patent: 6111264 (2000-08-01), Wolstenholme et al.
patent: 6114713 (2000-09-01), Zahorik
patent: 6117720 (2000-09-01), Harshfield
patent: 6147395 (2000-11-01), Gilgen
patent: 6150253 (2000-11-01), Doan et al.
patent: 6153890 (2000-11-01), Wolstenholme et al.
patent: 6177317 (2001-01-01), Huang et al.
patent: 6185122 (2001-02-01), Johnson et al.
patent: 6189582 (2001-02-01), Reinberg et al.
patent: 6236059 (2001-05-01), Wolstenholme et al.
patent: RE37259 (2001-07-01), Ovshinsky
patent: 6271090 (2001-08-01), Huang et al.
patent: 6280684 (2001-08-01), Yamada et al.
patent: 6287887 (2001-09-01), Gilgen
patent: 6291137 (2001-09-01), Lyons et al.
patent: 6314014 (2001-11-01), Lowrey et al.
patent: 6316348 (2001-11-01), Fu et al.
patent: 6320786 (2001-11-01), Chang et al.
patent: 6326307 (2001-12-01), Lindley et al.
patent: 6339544 (2002-01-01), Chiang et al.
patent: 6351406 (2002-02-01), Johnson et al.
patent: 6372651 (2002-04-01), Yang et al.
patent: 6380068 (2002-04-01), Jeng et al.
patent: 6420215 (2002-07-01), Knall et al.
patent: 6420216 (2002-07-01), Clevenger et al.
patent: 6420725 (2002-07-01), Harshfield
patent: 6423621 (2002-07-01), Doan et al.
patent: 6429064 (2002-08-01), Wicker
patent: 6440837 (2002-08-01), Harshfield
patent: 6462353 (2002-10-01), Gilgen
patent: 6483736 (2002-11-01), Johnson et al.
patent: 6487114 (2002-11-01), Jong et al.
patent: 6501111 (2002-12-01), Lowrey
patent: 6511867 (2003-01-01), Lowrey et al.
patent: 6512241 (2003-01-01), Lai
patent: 6514788 (2003-02-01), Quinn
patent: 6514820 (2003-02-01), Ahn et al.
patent: 6534781 (2003-03-01), Dennison
patent: 6545903 (2003-04-01), Wu
patent: 6551866 (2003-04-01), Maeda et al.
patent: 6555860 (2003-04-01), Lowrey et al.
patent: 6563156 (2003-05-01), Harshfield
patent: 6566700 (2003-05-01), Xu
patent: 6567293 (2003-05-01), Lowrey et al.
patent: 6576546 (2003-06-01), Gilbert et al.
patent: 6579760 (2003-06-01), Lung
patent: 6586761 (2003-07-01), Lowrey
patent: 6589714 (2003-07-01), Maimon et al.
patent: 6593176 (2003-07-01), Dennison
patent: 6596589 (2003-07-01), Tseng et al.
patent: 6597009 (2003-07-01), Wicker
patent: 6605527 (2003-08-01), Dennison et al.
patent: 6605821 (2003-08-01), Lee et al.
patent: 6607974 (2003-08-01), Harshfield
patent: 6613604 (2003-09-01), Maimon et al.
patent: 6617192 (2003-09-01), Lowrey et al.
patent: 6620715 (2003-09-01), Blosse et al.
patent: 6621095 (2003-09-01), Chiang et al.
patent: 6627530 (2003-09-01), Li et al.
patent: 6639849 (2003-10-01), Takahashi et al.
patent: 6673700 (2004-01-01), Dennison et al.
patent: 6674115 (2004-01-01), Hudgens et al.
patent: 6677678 (2004-01-01), Biolsi et al.
patent: 6744088 (2004-06-01), Dennison
patent: 6746892 (2004-06-01), Lee et al.
patent: 6750079 (2004-06-01), Lowrey et al.
patent: 6750101 (2004-06-01), Lung et al.
patent: 6791102 (2004-09-01), Johnson et al.
patent: 6797979 (2004-09-01), Chiang et al.
patent: 6800504 (2004-10-01), Li et al.
patent: 6800563 (2004-10-01), Xu
patent: 6808991 (2004-10-01), Tung et al.
patent: 6815704 (2004-11-01), Chen
patent: 6830952 (2004-12-01), Lung et al.
patent: 6838692 (2005-01-01), Lung et al.
patent: 6850432 (2005-02-01), Lu et al.
patent: 6859389 (2005-02-01), Idehara et al.
patent: 6861267 (2005-03-01), Xu et al.
patent: 6864500 (2005-03-01), Gilton
patent: 6864503 (2005-03-01), Lung
patent: 6867638 (2005-03-01), Saiki et al.
patent: 6881603 (2005-04-01), Lai
patent: 6888750 (2005-05-01), Walker et al.
patent: 6894304 (2005-05-01), Moore
patent: 6894305 (2005-05-01), Yi et al.
patent: 6900517 (2005-05-01), Tanaka et al.
patent: 6903362 (2005-06-01), Wyeth et al.
patent: 6909107 (2005-06-01), Rodgers et al.
patent: 6910907 (2005-06-01), Layadi et al.
patent: 6927410 (2005-08-01), Chen
patent: 6928022 (2005-08-01), Cho et al.
patent: 6933516 (2005-08-01), Xu
patent: 6936544 (2005-08-01), Huang et al.
patent: 6936840 (2005-08-01), Sun et al.
patent: 6937507 (2005-08-01), Chen
patent: 6943365 (2005-09-01), Lowrey et al.
patent: 6969866 (2005-11-01), Lowrey et al.
patent: 6972428 (2005-12-01), Maimon
patent: 6972430 (2005-12-01), Casagrande et al.
patent: 6977181 (2005-12-01), Raberg et al.
patent: 6992932 (2006-01-01), Cohen et al.
patent: 7023009 (2006-04-01), Kostylev et al.
patent: 7033856 (2006-04-01), Lung et al.
patent: 7038230 (2006-05-01), Chen et al.
patent: 7038938 (2006-05-01), Kang et al.
patent: 7042001 (2006-05-01), Kim et al.
patent: 7054183 (2006-05-01), Rinerson et al.
patent: 7067837 (2006-06-01), Hwang et al.
patent: 7067864 (2006-06-01), Nishida et al.
patent: 7067865 (2006-06-01), Lung et al.
patent: 7078273 (2006-07-01), Matsuoka et al.
patent: 7099180 (2006-08-01), Dodge et al.
patent: 7115927 (2006-10-01), Hideki et al.
patent: 7122281 (2006-10-01), Pierrat
patent: 7122824 (2006-10-01), Khouri et al.
patent: 7126149 (2006-10-01), Iwasaki et al.
patent: 7132675 (2006-11-01), Gilton
patent: 7154774 (2006-12-01), Bedeschi et al.
patent: 7164147 (2007-01-01), Lee et al.
patent: 7166533 (2007-01-01), Happ
patent: 7169635 (2007-01-01), Kozicki
patent: 7202493 (2007-04-01), Lung et al.
patent: 7208751 (2007-04-01), Ooishi et al.
patent: 7214958 (2007-05-01), Happ
patent: 7220983 (2007-05-01), Lung
patent: 7229883 (2007-06-01), Wang et al.
patent: 7238959 (2007-07-01), Chen
patent: 7238994 (2007-07-01), Chen et al.
patent: 7248494 (2007-07-01), Oh et al.
patent: 7251157 (2007-07-01), Osada et al.
patent: 7253429 (2007-08-01), Klersy et al.
patent: 7254059 (2007-08-01), Li et al.
patent: 7269052 (2007-09-01), Segal et al.
patent: 7277317 (2007-10-01), Le Phan et al.
patent:

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