Ceramic thin film memory device

Static information storage and retrieval – Systems using particular element – Resistive

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

365163, 365174, 257 2, 257 5, G11C 1156

Patent

active

052933350

ABSTRACT:
A digital memory circuit for electronic applications. The circuit has at least one memory element connected in series with a load resistor. The digital memory circuit also includes a voltage supply and a data output terminal. The memory element in the digital memory circuit is in the form of a silicon dioxide film derived from a hydrogen silsesquioxane resin. The silicon dioxide film is characterized by a jV curve which includes both resistive and conductive regions for the memory element.

REFERENCES:
patent: 3149398 (1964-09-01), Sprague
patent: 3271591 (1966-09-01), Ovshinsky
patent: 3644741 (1972-02-01), Ovshinsky
patent: 3823331 (1974-07-01), Fritzsche et al.
patent: 3827033 (1974-07-01), Quilliam
patent: 3953375 (1976-04-01), Nagano
patent: 4052340 (1977-10-01), Einthoven
patent: 4205387 (1980-05-01), Ovshinsky
patent: 4684972 (1987-08-01), Owen
patent: 4756977 (1988-07-01), Haluska
patent: 4795657 (1989-01-01), Formiboni et al.
patent: 4818717 (1989-04-01), Johnson
patent: 5151384 (1992-09-01), Williams
H. Fritzsche, "Physics of Instabilities in Amorphous Semiconductors," IBM J. Res. Develop., Sep. 1969, pp. 515-521.
R Neale et al., "The Application of Amorphous Materials to Computer Memories," IEEE Trans. on Elec. Dev., vol. ED-20, No. 2, Feb. 1973, pp. 195-205.
Bullot et al., Physica Status Solidi, (a) 71, K1-K4 (1982), "Threshold Switching in V.sub.2 or Layers . . . ".
Ansari et al., Journal of Physics, D: Applied Physics 20, (1987), pp. 1063-1066, "Pre-and Post-Threshold Conduction Mechanisms in Thermally Grown Titanium Oxide Films".
Ramesham et al., NASA Tech Briefs, Dec. 1989, p. 28, "Memory Switches Based on MnO.sub.2-x Thin Films".
Morgan et al., Thin Solid Films, 15 (1973) pp. 123-131, "Electroforming and Dielectric Breakdown . . . ".
Simmons, Handbook of Thin Film Technology, Chapter 14 (1970) pp. 14-38 to 14-43, "Negative Resistance and Memory Effects".
Al-Ismail et al., Journal of Material Science, 20 (1985) pp. 2186-2192, "Forming, Negative-Resistance, . . . ".
Morgan et al., Thin Solid Films, 20, (1974), pp. S7-S9, "Threshold and Memory Switching in Silicon Oxide Films".
Boelle et al., Applied Surface Science, 46, (1990) pp. 200-205, "Sol-Gelow-Temp. Prep. of Silica Films; . . . ".
Klein et al, Journal of Applied Physics, vol. 40, No. 7, Jun. (1969), pp. 2728-2740, "Electrical Pulse Breakdown of Silicon Oxide Films".

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ceramic thin film memory device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ceramic thin film memory device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ceramic thin film memory device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-158056

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.