Ceramic substrate for semiconductor production and inspection

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – Insulating material

Reexamination Certificate

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Details

C257S701000, C257S705000, C219S552000, C219S520000

Reexamination Certificate

active

06849938

ABSTRACT:
An object of the present invention is to provide a ceramic substrate for a semiconductor producing/examining device, capable of controlling the temperature of a resistance heating element, thereby suitably controlling the temperature of a semiconductor wafer placed on a ceramic substrate or the like and evenly heating the semiconductor wafer. The ceramic substrate for a semiconductor producing/examining device according to the present invention comprises at least a resistance heating element formed on a surface thereof or inside thereof, wherein a region: where a semiconductor wafer is directly placed; or where a semiconductor wafer is placed apart from the surface thereof while keeping a given distance, exists inside a surface region corresponding to the region where said resistance heating element is formed.

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patent: 2000 114354 (2000-04-01), None

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