Ceramic composition for an apparatus and method for processing a

Details Ceramic composition for an apparatus and method for processing a Ceramic composition for an apparatus and method for processing a

1998-07-29

2000-09-26

Beck, Shrive

Adhesive bonding and miscellaneous chemical manufacture

Methods

118723I, 118723AN, 501127, H05H 100, C23C 1600

Patent

active

061237914

ABSTRACT:
A ceramic composition of matter for a process kit and a dielectric window of a reactor chamber wherein substrates are processed in a plasma of a processing gas. The ceramic composition of matter contains a ceramic compound (e.g. Al.sub.2 O.sub.3) and an oxide of a Group IIIB metal (e.g., Y.sub.2 O.sub.3). A method for processing (e.g. etching) a substrate in a chamber containing a plasma of a processing gas. The method includes passing processing power through a dielectric window which is formed from the ceramic composition of matter.

REFERENCES:
patent: 4244743 (1981-01-01), Blackburn et al.
patent: 5498313 (1996-03-01), Bailey et al.
patent: 5680013 (1997-10-01), Dornfest et al.
patent: 5753044 (1998-05-01), Hanawa et al.

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