Drying and gas or vapor contact with solids – Apparatus – With apparatus using centrifugal force
Reexamination Certificate
2006-02-07
2006-02-07
Bennett, Henry (Department: 3743)
Drying and gas or vapor contact with solids
Apparatus
With apparatus using centrifugal force
C034S059000, C034S312000, C034S317000, C073S572000
Reexamination Certificate
active
06993854
ABSTRACT:
A centrifugal dryer of the present invention includes: a chamber for performing drying processing for plural substrates; a cradle, installed inside chamber, and drying plural substrates by rotation driving in a state of being held therein; and an elastic wave sensor for detecting an elastic wave generating upon striking of a chip from plural substrates to said chamber during the processing therefor.
REFERENCES:
patent: 9-210973 (1997-08-01), None
patent: 10-160563 (1998-06-01), None
patent: 11-121430 (1999-04-01), None
patent: 11-121430 (1999-04-01), None
patent: 2000-353684 (2000-12-01), None
patent: 2000-353684 (2000-12-01), None
patent: 2000-353685 (2000-12-01), None
patent: 1997-0009982 (1997-03-01), None
Ise Hirotoshi
Mizuno Tatsuo
Oono Toshiki
Bennett Henry
Mitsubishi Electric Engineering Company Limited
Nguyen Camtu
Renesas Technology Corp.
LandOfFree
Centrifugal dryer, manufacturing method for semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Centrifugal dryer, manufacturing method for semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Centrifugal dryer, manufacturing method for semiconductor... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3687091