Central management system of wet chemical stations

Details Central management system of wet chemical stations Central management system of wet chemical stations

1995-09-01

1997-09-30

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

134113, B44C 100

Patent

active

056722303

ABSTRACT:
A central management system for wet chemical cleaning stations includes a number of wet chemical cleaning stations each having a liquid bath, filter, pump and multiple sensors for sensing the process variables thereof; and a main computer connected to the wet chemical cleaning stations to display, store and process data sensed by the sensors and totally manage the data, to thereby enable effective central management of the cleaning process via the main computer.

REFERENCES:
patent: 5421905 (1995-06-01), Ueno et al.

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