Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1998-06-30
2000-02-22
Dang, Thi
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
118723I, 118723IR, H05H 100
Patent
active
060276061
ABSTRACT:
The invention is embodied by a plasma reactor for processing a workpiece, including a reactor enclosure defining a processing chamber, a semiconductor ceiling window, a base within the chamber for supporting the workpiece during processing thereof, the semiconductor ceiling including a gas inlet system for admitting a plasma precursor gas into the chamber through the ceiling, and apparatus for coupling plasma source power into the chamber.
REFERENCES:
patent: 4948458 (1990-08-01), Ogle
patent: 5187454 (1993-02-01), Collins et al.
patent: 5392018 (1995-02-01), Collins et al.
Chang Mei
Collins Kenneth
Hung Raymond
Lee Ru-Liang Julian
Mohn John
Applied Materials Inc.
Dang Thi
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