X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2011-04-05
2011-04-05
Kao, Chih-Cheng G (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000, C378S071000
Reexamination Certificate
active
07920676
ABSTRACT:
CD-GISAXS achieves reduced measurement times by increasing throughput using longer wavelength radiation (˜12×, for example) such as x-rays in reflective geometry to increase both the collimation acceptance angle of the incident beams and the scattering signal strength, resulting in a substantial combined throughput gain. This wavelength selection and geometry can result in a dramatic reduction in measurement time. Furthermore, the capabilities of the CD-GISAXS can be extended to meet many of the metrology needs of future generations of semiconductor manufacturing and nanostructure characterization, for example.
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Nill Kenneth W.
Seshadri Srivatsan
Wang Yuxin
Yun Wenbing
Houston Eliseeva LLP
Kao Chih-Cheng G
Xradia, Inc.
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