CCD gate definition process

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

29571, 29580, 29578, 156643, 156648, 156651, 156653, 156657, 156662, 357 24, 357 59, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

046523391

ABSTRACT:
A CCD gate definition process utilizing a thin film layer in a double masking process to form a first and second oxide layer over the polysilicon gate material to provide a profiled and tapered oxide layer over the gate without any re-entrant oxide steps.

REFERENCES:
patent: 3506441 (1970-04-01), Gottfried
patent: 3823015 (1974-07-01), Fassett
patent: 4053349 (1977-10-01), Sinko
patent: 4061530 (1977-12-01), Hosack
patent: 4063992 (1977-12-01), Hosack
patent: 4352870 (1982-10-01), Howard et al.

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