CCD gate definition process

Details CCD gate definition process CCD gate definition process

1986-02-24

1987-03-24

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

29571, 29580, 29578, 156643, 156648, 156651, 156653, 156657, 156662, 357 24, 357 59, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

046523391

ABSTRACT:
A CCD gate definition process utilizing a thin film layer in a double masking process to form a first and second oxide layer over the polysilicon gate material to provide a profiled and tapered oxide layer over the gate without any re-entrant oxide steps.

REFERENCES:
patent: 3506441 (1970-04-01), Gottfried
patent: 3823015 (1974-07-01), Fassett
patent: 4053349 (1977-10-01), Sinko
patent: 4061530 (1977-12-01), Hosack
patent: 4063992 (1977-12-01), Hosack
patent: 4352870 (1982-10-01), Howard et al.

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