Catoptric objectives and systems using catoptric objectives

Details Catoptric objectives and systems using catoptric objectives Catoptric objectives and systems using catoptric objectives

2006-09-13

2008-08-19

Lester, Evelyn A. (Department: 2873)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S366000, C359S726000, C359S731000, C359S733000, C359S649000, C359S650000, C359S651000

Reexamination Certificate

active

07414781

ABSTRACT:
In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.

REFERENCES:
patent: 4650292 (1987-03-01), Baker et al.
patent: 5071240 (1991-12-01), Ichihara et al.
patent: 5309276 (1994-05-01), Rodgers
patent: 6172825 (2001-01-01), Takahashi
patent: 6266389 (2001-07-01), Murayama et al.
patent: 6302548 (2001-10-01), Takahashi et al.
patent: 6426506 (2002-07-01), Hudyma
patent: 6850361 (2005-02-01), Nakano et al.
patent: 6922291 (2005-07-01), Sunaga et al.
patent: 2004/0070743 (2004-04-01), Hudyma et al.
patent: 2005/0134980 (2005-06-01), Mann et al.
patent: 2006/0232867 (2006-10-01), Mann et al.
patent: 2006/0284113 (2006-12-01), Chang et al.
patent: 2007/0195317 (2007-08-01), Schotter et al.
patent: 1 335 229 (2003-08-01), None
patent: 1 450 196 (2004-08-01), None
patent: 1 450 209 (2004-08-01), None
patent: 1 376 191 (2007-01-01), None

Affiliated with

Also associated with

Rating

Catoptric objectives and systems using catoptric objectives does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Catoptric objectives and systems using catoptric objectives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Catoptric objectives and systems using catoptric objectives will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4019162