Cathodic sputtering system

Details Cathodic sputtering system Cathodic sputtering system

1995-05-24

1996-07-23

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429807, C23C 1435

Patent

active

055386091

ABSTRACT:
An evacuable chamber serving as a cathode contains a rotatable magnet system and is connected to a high frequency power supply for sputtering a target. The chamber is electrically isolated from an evacuable housing containing the substrate to be coated, the chamber being covered by a cup-like shield fixed to the housing to define an interior space. A pipe for evacuating the chamber includes first and second sections separated by a gap and connected by an electrically insulating collar in which parallel metal grids are installed in the gap and respectively connected to the power source and to ground in order to prevent the formation of secondary plasma.

REFERENCES:
patent: 4444643 (1984-04-01), Garrett
patent: 4714536 (1987-12-01), Freeman et al.
patent: 5433835 (1995-07-01), Demaray et al.

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