Cathode mounting for ion source with indirectly heated cathode

Details Cathode mounting for ion source with indirectly heated cathode Cathode mounting for ion source with indirectly heated cathode

1996-10-30

1998-06-09

Nguyen, Kiet T.

Radiant energy

Ion generation

Electron bombardment type

250423R, 25049221, H01J 3708

Patent

active

057638900

ABSTRACT:
An ion source is for use in an ion implanter. The ion source comprises a gas confinement chamber having conductive chamber walls that bound a gas ionization zone. The gas confinement chamber includes an exit opening to allow ions to exit the chamber. A base positions the gas confinement chamber relative to structure for forming an ion beam from ions exiting the gas confinement chamber.

REFERENCES:
patent: 4641031 (1987-02-01), Ito et al.
patent: 4672210 (1987-06-01), Armstrong et al.
patent: 5026997 (1991-06-01), Benveniste
patent: 5262652 (1993-11-01), Bright et al.
patent: 5420415 (1995-05-01), Trueira
patent: 5497006 (1996-03-01), Sferlazzo et al.
patent: 5554852 (1996-09-01), Bright et al.

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