Catadioptric system for photolithography

Details Catadioptric system for photolithography Catadioptric system for photolithography

1997-06-12

1998-09-08

Sugarman, Scott J.

Optical: systems and elements

Lens

With reflecting element

359732, 359738, G02B 1708

Patent

active

058053573

ABSTRACT:
Catadioptric systems are disclosed that project a demagnified image of an object on a substrate. A first optical system substantially collimates a light flux from the object and directs the light flux to a beamsplitter provided with a reflecting surface. A second optical system comprising a concave mirror and a negative lens and having unit magnification receives the light flux from the beamsplitter and directs the light flux back to the beamsplitter. A third optical system then receives the light flux from the beamsplitter and forms an image of the object on the substrate. The catadioptric systems satisfy various conditions.

REFERENCES:
patent: 5289312 (1994-02-01), Hashimoto et al.
patent: 5668672 (1997-09-01), Oomura
patent: 5694241 (1997-12-01), Ishiyama et al.

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