Catadioptric projection system for 157 nm lithography

Details Catadioptric projection system for 157 nm lithography Catadioptric projection system for 157 nm lithography

2007-07-03

2007-07-03

Allen, Stephone B. (Department: 2872)

Optical: systems and elements

Mirror

Plural mirrors or reflecting surfaces

C359S364000, C359S730000, C359S857000

Reexamination Certificate

active

10771986

ABSTRACT:
A photolithographic reduction projection catadioptric objective includes a first optical group G1including an even number of at least four mirrors M1–M6;and a second at least substantially dioptric optical group G2imageward than the first optical group G1including a number of lenses E4–E13.The first optical group G1provides compensative axial aberrative correction for the second optical group G2which forms an image with a numerical aperture of at least substantially 0.65, and preferably at least 0.70 or 0.75. Six mirror examples are shown.

REFERENCES:
patent: 3762801 (1973-10-01), Baker
patent: 4171871 (1979-10-01), Dill et al.
patent: 4232969 (1980-11-01), Wilczynski
patent: 4595295 (1986-06-01), Wilczynski
patent: 4685777 (1987-08-01), Hirose
patent: 4701035 (1987-10-01), Hirose
patent: 4757354 (1988-07-01), Sato et al.
patent: 4812028 (1989-03-01), Matsumoto et al.
patent: 5052763 (1991-10-01), Singh et al.
patent: 5063586 (1991-11-01), Jewell et al.
patent: 5071240 (1991-12-01), Ichihara et al.
patent: 5078502 (1992-01-01), Cook
patent: 5089913 (1992-02-01), Singh et al.
patent: 5153898 (1992-10-01), Suzuki et al.
patent: 5159172 (1992-10-01), Goodman et al.
patent: 5212588 (1993-05-01), Viswanathan et al.
patent: 5220590 (1993-06-01), Bruning et al.
patent: 5241423 (1993-08-01), Chiu et al.
patent: 5315629 (1994-05-01), Jewell et al.
patent: 5323263 (1994-06-01), Schoenmakers
patent: 5353322 (1994-10-01), Bruning et al.
patent: 5401934 (1995-03-01), Ainsworth, Jr. et al.
patent: 5410434 (1995-04-01), Shafer
patent: 5515207 (1996-05-01), Foo
patent: 5537260 (1996-07-01), Williamson
patent: 5575207 (1996-11-01), Shimizu
patent: 5592329 (1997-01-01), Ishiyama et al.
patent: 5608526 (1997-03-01), Piwonka-Corle et al.
patent: 5650877 (1997-07-01), Phillips et al.
patent: 5652679 (1997-07-01), Freeman
patent: 5684636 (1997-11-01), Chow et al.
patent: 5686728 (1997-11-01), Shafer
patent: 5694241 (1997-12-01), Ishiyama et al.
patent: 5742436 (1998-04-01), Furter
patent: 5805357 (1998-09-01), Omura
patent: 5805365 (1998-09-01), Sweatt
patent: 5815310 (1998-09-01), Williamson
patent: 5835275 (1998-11-01), Takahashi et al.
patent: 5940222 (1999-08-01), Sinclair et al.
patent: 5956192 (1999-09-01), Williamson
patent: 6008885 (1999-12-01), Takashi et al.
patent: 6014252 (2000-01-01), Shafer
patent: 6033079 (2000-03-01), Hudyma
patent: 6084724 (2000-07-01), Wiegand et al.
patent: 6142641 (2000-11-01), Cohen et al.
patent: 6169627 (2001-01-01), Schuster
patent: 6172825 (2001-01-01), Takahashi
patent: 6185049 (2001-02-01), Terada et al.
patent: 6255661 (2001-07-01), Braat
patent: 6636350 (2003-10-01), Shafer et al.
patent: 2001/0043391 (2001-11-01), Shafer et al.
patent: 197 26 058 (1998-01-01), None
patent: 196 39 586 (1998-04-01), None
patent: 0 779 528 (1997-06-01), None
patent: 0 604 093 (1997-11-01), None
patent: 0 869 383 (1998-10-01), None
patent: 0 816892 (1999-06-01), None
patent: 1 069 448 (2000-07-01), None
patent: 1 067 448 (2001-01-01), None
patent: 1 336 887 (2003-08-01), None
patent: WO-94/06047 (1994-03-01), None
Morgan, Joseph, Introduction to Geometrical and Physical Optics, McGraw-Hill, 1953, p. 2.
Smith, Warren J. Modern Optical Engineering: the Design of Optical Systems, 3rd Ed, McGraw-Hill, 2000, p. 98.

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