Optical: systems and elements – Diffraction – From grating
Patent
1996-08-07
1998-06-02
Henry, Jon W.
Optical: systems and elements
Diffraction
From grating
359566, 359576, 359 34, 385 37, G02B 518, G02B 2744, G02B 104, G02B 634
Patent
active
057609608
ABSTRACT:
Cascaded diffraction grated pairs are employed to form submicron gratings and other patterns in various types of devices using photolithographic, UV exposure and other techniques. Cascaded grating pairs are formed in masks which are positioned between a source of radiation and the device or substrate in which a grating is to be formed. The interaction of the diffracted beams generated by each diffraction grating in a cascade grating pair results in the device grating having a period which is substantially smaller than that of either of the gratings in the cascaded grating pair. As a result, gratings with substantially smaller periods than were previously obtainable can now be achieved using conventional fabrication techniques. To eliminate sensitivity to background exposure in photolithographic fabrication applications, a mask is employed in which first and second cascaded grating pairs are separated from one another by an opaque region that acts as a spatial filter. The mask is positioned above the target device or substrate at a distance which causes the diffracted radiation beams from each of the cascaded grating pairs to interfere with one another on the device in the area where the diffraction grating is to be formed.
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Lin, C. H. et al., "Gratings Fabricated by Cascaded, Self-Induced Holography for DFB Lasers", CLZO Conference, May 22, 1995, pp. 1-5.
Lin Chih-Hsien Jason
Lo Yu-Hwa
Cornell Research Foundation Inc.
Henry Jon W.
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