Carrier head of chemical mechanical polishing apparatus...

Details Carrier head of chemical mechanical polishing apparatus... Carrier head of chemical mechanical polishing apparatus...

2007-12-04

2007-12-04

Eley, Timothy V. (Department: 3724)

Abrading

Machine

Rotary tool

C451S288000, C451S397000, C451S402000

Reexamination Certificate

active

10959113

ABSTRACT:
A carrier head of a chemical mechanical polishing apparatus has a support, an elastic membrane secured to the support and spaced from the bottom surface of the support so that a pressure chamber is defined between the membrane and the bottom surface of the support; and at least one annular barrier of elastic material extending from the bottom surface of the support. Each barrier has an annular partition portion that extends through the pressure chamber and divides the pressure chamber into respective pressure zones on opposite sides thereof, and an annular contact portion that abuts the membrane such that the barrier contacts the membrane but is not fixedly attached thereto. The contact portion includes a pair of annular flanges extending laterally in opposite directions at the lower end of the partition portion.

REFERENCES:
patent: 5423716 (1995-06-01), Strasbaugh
patent: 5916016 (1999-06-01), Bothra
patent: 5964653 (1999-10-01), Perlov et al.
patent: 6210255 (2001-04-01), Zuniga et al.
patent: 6361419 (2002-03-01), Zuniga et al.
patent: 6390905 (2002-05-01), Korovin et al.
patent: 6979250 (2005-12-01), Zuniga et al.
patent: 7033260 (2006-04-01), Togawa et al.
patent: 7101271 (2006-09-01), Moon
patent: 7140956 (2006-11-01), Korovin et al.
patent: 11-226865 (1999-08-01), None
patent: 10-2002-7012953 (2003-03-01), None

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